KLA Tencor 710-659274-00單軸控制器 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
KLA Tencor 710-659274-00 單軸控制器是一種專(zhuān)為精密運動(dòng)控制而設計的高性能控制模塊，廣泛應用于半導體制造與檢測設備中。以下是其主要產(chǎn)品應用領(lǐng)域：
一、半導體設備
晶圓檢測系統（Wafer Inspection）
用于驅動(dòng)和控制晶圓載臺的單軸精密移動(dòng)，實(shí)現高分辨率掃描和定位。
例如在Surfscan、e-Beam或光學(xué)檢測系統中，確保精確線(xiàn)掃或點(diǎn)檢位置。
光刻機（Photolithography）
控制掩膜或晶圓平臺的線(xiàn)性移動(dòng)，實(shí)現亞微米級對準。
與激光干涉儀系統協(xié)同，確保穩定軌跡與同步反饋。
量測系統（Metrology Tools）
用于控制探頭、激光或攝像頭的單軸滑動(dòng)，實(shí)現對厚度、步高、CD等參數的精準測量。
支持閉環(huán)控制與快速響應機制。
二、精密加工與納米級運動(dòng)平臺
在納米壓印、精密蝕刻、離子注入等設備中，用于驅動(dòng)移動(dòng)組件，實(shí)現高速度與低誤差加工。
控制單軸滑臺以進(jìn)行樣品搬運、工藝流程切換。
三、顯微鏡成像與缺陷分析
用于電子顯微鏡系統（如SEM或TEM）中控制樣本托盤(pán)的X/Y/Z單軸運動(dòng)，以獲得多角度成像。
支持對缺陷區域的精準復查與自動(dòng)重定位。
英文資料：
The KLA Tencor 710-659274-00 single axis controller is a high-performance control module designed specifically for precision motion control, widely used in semiconductor manufacturing and testing equipment. The following are the main application areas of its products:
1、 Semiconductor equipment
Wafer Inspection System
Used for driving and controlling the single axis precision movement of wafer stages, achieving high-resolution scanning and positioning.
For example, in Surfscan, e-beam, or optical detection systems, ensure precise line scanning or spot checking positions.
Photolithography machine
Control the linear movement of the mask or wafer platform to achieve sub micron level alignment.
Collaborate with the laser interferometer system to ensure stable trajectory and synchronized feedback.
Metrology Tools
Used to control the single axis sliding of probes, lasers or cameras, achieving precise measurement of parameters such as thickness, step height, CD, etc.
Support closed-loop control and fast response mechanism.
2、 Precision machining and nanoscale motion platform
Used in nanoimprint, precision etching, ion implantation and other equipment to drive moving components and achieve high-speed and low error processing.
Control the single axis slide table for sample handling and process flow switching.
3、 Microscopic imaging and defect analysis
Used for controlling the X/Y/Z uniaxial movement of sample trays in electron microscopy systems (such as SEM or TEM) to obtain multi angle imaging.
Support precise re examination and automatic repositioning of defect areas.
2.產(chǎn) 品 展 示
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